Photocatalytically Active Semiconductor Cu3P Unites with Flocculent TiN for Efficient Removal of Sulfamethoxazole

Sulfamethoxazole is a widely—used antibiotic with high water solubility and low biodegradability, which was considered refractory environmental pollutant. Hence, series of functionalized hybrids uniting Cu3P TiN were prepared. The Cu3P/TiN—x composites remarkably removed the sulfamethoxazole in solution compared alone. All as—prepared integrated advantages strong adsorption photocatalysis achieved removal rates above 70% sulfamethoxazole. Among composites, Cu3P/TiN—2 1:1 molar ratio Cu: Ti reached 90% rate under dark for 30 min subsequent photodegradation 120 min. enhanced performance attributed to introduced flocculent large specific surface area conductivity that provide more reactive sites electron transferability. Meanwhile, corrosion resistance chemical stability also beneficial improved performance. Cycling experiments further demonstrate reliability composites. In addition, capture indicated superoxide radical (·O2−) hydroxyl (·OH) played major role degradation.